首页> 外文期刊>Indian Journal of Pure & Applied Physics >Low and high energy deuterium ions emission in a 4.7 kJ plasma focus device and its variation with gas filling pressure
【24h】

Low and high energy deuterium ions emission in a 4.7 kJ plasma focus device and its variation with gas filling pressure

机译:4.7 kJ等离子体聚焦装置中低能和高能氘离子的发射及其随充气压力的变化

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Plasma Focus (PF) being a good source of electromagnetic radiations, ions and electrons, their characterization could be helpful in understanding the dynamics and various processes undergoing in this device. The emission of deuterium ions from PF at different filling gas pressures in the range 1-5 mbar has been studied in the present paper. An anti conical Faraday Cup (FC) has been designed and developed to detect ion flux. From the recorded signals, two peaks have been observed corresponding to low energy (a few eV) and high energy (few keV to hundreds of keV) ions. This study on measurement of poly energy ions flux at different filling gas pressures shows that the ratio of higher energy ions flux to lower energy ions flux increases with lowering the pressure and could be attributed to anomalous resistance in PF device.
机译:等离子体聚焦(PF)是电磁辐射,离子和电子的良好来源,其表征可能有助于理解该设备的动力学和各种过程。本文研究了在1-5毫巴范围内的不同填充气体压力下,PF的氘离子的发射。设计并开发了一个反锥形法拉第杯(FC)以检测离子通量。从记录的信号中,观察到两个峰,分别对应于低能(几个eV)和高能(几个keV至数百keV)离子。对不同填充气压下多能离子通量的测量研究表明,随着压力的降低,高能离子通量与低能离子通量之比增加,这可能归因于PF装置的电阻异常。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号