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Low-k Dielectrics: Will Spin-On or CVD Prevail?

机译:Low-k Dielectrics: Will Spin-On or CVD Prevail?

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摘要

With announcements that IBM will use spin-on SiLK, Texas Instruments will use Black Diamond CVD and LSI Logic will use FlowFill CVD, companies are taking different approaches to lowering k, the dielectric constant of the interlevel dielectric.

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