首页> 外文期刊>Indian Journal of Chemical Technology >Corrosion protection of copper by self assembled nano film of 4-amino-3-(octadecylthio)-6-methyl-1,2,4-triazinone
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Corrosion protection of copper by self assembled nano film of 4-amino-3-(octadecylthio)-6-methyl-1,2,4-triazinone

机译:4-氨基-3-(十八烷基硫基)-6-甲基-1,2,4-三嗪酮自组装纳米膜对铜的腐蚀防护

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摘要

Self-assembled nano film of 4-amino-3-(octadecylthio)-6-methyl-l,2,4-triazinone (AOTMT) has been developed on fresh copper surface at ambient temperature. The optimum conditions for the formation of AOTMT nano film have been established through electrochemical impedance and quartz crystal nanobalance studies. The AOTMT film on copper surface is characterized by contact angle measurement, X-ray photoelectron spectroscopy (XPS), reflection absorption FTIR spectroscopy and atomic force microscopy. It is inferred that the formation of AOTMT film is through chemisorption of AOTMT on copper surface due to the nitrogen and subsequent complex formation between AOTMT and Cu~+ ions. Corrosion protection ability of AOTMT nano film is evaluated in dilute aqueous HC1 environment using impedance, potentiodynamic polarization, cyclic voltammetry (CV), weight-loss and XPS studies. The results show that AOTMT nano film affords excellent corrosion protection to copper in HC1 environment. The CV studies show good stability of AOTMT nano fdm. Potentiodynamic polarization studies reveal that the AOTMT nano film functions as a cathodic inhibitor. The mechanistic aspects of corrosion protection of copper by AOTMT nano fdm are also discussed.
机译:4-氨基-3-(十八烷基硫基)-6-甲基-1,2,4-三嗪酮(AOTMT)的自组装纳米膜已在室温下在新鲜的铜表面上显影。通过电化学阻抗和石英晶体纳米平衡研究,已经确定了形成AOTMT纳米膜的最佳条件。铜表面的AOTMT膜的特征在于接触角测量,X射线光电子能谱(XPS),反射吸收FTIR光谱和原子力显微镜。可以推断,由于氮的存在,AOTMT膜的形成是由于AOTMT在铜表面的化学吸附,以及随后AOTMT与Cu〜+离子之间形成络合物。使用阻抗,电势极化,循环伏安法(CV),重量减轻和XPS研究,在稀HCl水溶液环境中评估了AOTMT纳米膜的腐蚀防护能力。结果表明,AOTMT纳米膜在HCl环境中对铜具有优异的腐蚀防护性能。 CV研究表明AOTMT纳米fdm具有良好的稳定性。电位动力极化研究表明,AOTMT纳米膜可作为阴极抑制剂。还讨论了通过AOTMT纳米fdm腐蚀铜的机理。

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