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首页> 外文期刊>Russian journal of applied chemistry >Kinetic Regularities of Etching Thin Lead Sulfide Films in Hydrochloric Acid Solutions Containing Hydrogen Peroxide and Glycerol
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Kinetic Regularities of Etching Thin Lead Sulfide Films in Hydrochloric Acid Solutions Containing Hydrogen Peroxide and Glycerol

机译:Kinetic Regularities of Etching Thin Lead Sulfide Films in Hydrochloric Acid Solutions Containing Hydrogen Peroxide and Glycerol

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摘要

The kinetic regularities are considered of etching thin films of lead sulfide in solutions containing hydrochloric acid, hydrogen peroxide, and glycerol under conditions of varying concentrations of the initial components and the etching temperature. The partial orders of the reaction were calculated: for hydrochloric acid the value was 2.8, for hydrogen peroxide, 0.2, and for glycerol, 0.5. The activation energy of the lead sulfide etching process was 48.1 kJ mol(-1).

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