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Wafer-scale plasmonic metal-dielectric-metal structural color featuring high saturation and low angular dependence

机译:具有高饱和度和低角度依赖性的晶圆级等离子体金属-介电-金属结构颜色

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摘要

Structural color has been studied through various methods due to its distinguished features of stability, durability, high information storage density and high integration. However, the artificial structural color samples do not exhibit superior performance in color saturation and low angular dependence. Here, we present an approach to acquire additive reflective color based on a metal-dielectric-metal (MDM) stack. The upper layer composed of Ag particles is perforated in a hexagonal arrangement which profits from the dielectric anodic aluminium oxide (AAO) membrane. The size and shape of the Ag particles are getting inhomogeneous as the deposition thickness of the upper layer increasing, which expands the desired absorption range of surface plasmons. The residual non-anodized Al foil serves as a highly reflective substrate for efficient color presenting through the thin-film interference in this plasmonic MDM system. As a result, the color gamut area of this MDM stack is extended 8 times in CIE chromaticity coordinates. Finally, a wafer-scale (diameter of 83 mm) badge of Harbin Engineering University (HEU) with highly saturated colors and a pattern characterized with low angle-dependent property (up to 60 degrees) are presented, which exhibit promising prospects in commercial coloring and imaging.
机译:结构颜色具有稳定性、耐久性、信息存储密度高、集成度高等特点,通过多种方法进行了研究。然而,人工结构色样品在色彩饱和度和低角度依赖性方面没有表现出优越的性能。在这里,我们提出了一种基于金属-介电-金属 (MDM) 堆栈获取加性反射色的方法。由Ag颗粒组成的上层以六边形排列穿孔,其受益于介电阳极氧化铝(AAO)膜。随着上层沉积厚度的增加,Ag颗粒的尺寸和形状变得不均匀,这扩大了表面等离子体的期望吸收范围。残留的非阳极氧化铝箔作为高反射基板,通过这种等离子体MDM系统中的薄膜干涉实现有效的颜色呈现。因此,此 MDM 堆栈的色域区域在 CIE 色度坐标中扩展了 8 倍。最后,介绍了哈尔滨工程大学(HEU)的晶圆级(直径83 mm)徽章,该徽章具有高饱和度的色彩和低角度依赖性(高达60度)的图案,在商业着色和成像方面具有广阔的前景。

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