Bi2WO6/UiO-66-NH2 photocatalysts were fabricated through solvothermal method using acetic acid as template. The photocatalytic performance of as-fabricated composites was highly improved under simulated visible light due to the addition of UiO-66-NH2. The structural and chemical properties of the composites were characterized through FTIR, XRD, XPS, SEM, BET, UV-vis DRS and PL. After 90 min of visible light irradiation, the RhB at an initial concentration of 10 mg center dot L-1 in the solution was degraded by 99.4% due to the addition of 10 mg of the composite. There was no significant decrease in the photocatalytic activity even after four rounds of cycles. The free radical capture experiments indicate that the photogenerated holes (h(+)) were the main active sites. The possible photocatalytic degradation mechanism was proposed as the specific surface area of the composite was enlarged due to the uniform distribution of UiO-66-NH2 on the surface of Bi2WO6. The electron-hole pairs recombination rate was decreased due to the photogenerated electrons (e(-)) on the CB of Bi2WO6 which can be rapidly transferred to the CB of UiO-66-NH2 and the photogenerated holes of UiO-66-NH2 transferred to the VB of Bi2WO6. Meanwhile, the RhB was directly oxidized to H2O and CO2 by h(+) to achieve the purification effect.
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