Microstructure and elastic properties of atomic layer deposited TiO_2 anatase thin films

摘要

Amorphous TiO_2 thin films were deposited by means of atomic layer deposition on Kapton substrates and then crystallized ex situ by annealing at 300 °C to obtain the anatase phase. The morphology, structure and microstructure of films treated for 12, 24, 72 and 90 h were investigated. The local Ti coordination changes were studied by X-ray near-edge structure (XANES).