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INFLUENCE OF UV-RADIATION ON SURFACE RELIEF AND PROPERTIES OF 2-CYCLOOCTYLAMINO-5-NITROPYRIDINE - FULLERENE THIN FILM FOR ORIENTATION OF LIQUID CRYSTALS

机译:INFLUENCE OF UV-RADIATION ON SURFACE RELIEF AND PROPERTIES OF 2-CYCLOOCTYLAMINO-5-NITROPYRIDINE - FULLERENE THIN FILM FOR ORIENTATION OF LIQUID CRYSTALS

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摘要

UV-radiation influence of the excimer lamp with the wavelength 126 and 173 nm on the surface relief and hydrophobic properties of the 2-cyclooctylamino-5-nitropyridine (COANP) - fullerene C-70 system thin-film has been studied. The periodical relief formation on the COANP + 5,0 wt. % C-70 thin-film surface has been shown using an atomic-force microscopy. The contact angles of the film surfaces were measured and the hydrophobic properties decrease was demonstrated. The polymerization and ablation processes as the possible mechanisms leading to the obtained results are discussed. Based on the experimental results, the article considers promising application areas of the obtained materials in the field of display technology, improvement of optical elements, including those for the optical limiting, as well as the use of UV-radiation of excimer lamps as a direct method for modifying surfaces of materials.

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