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首页> 外文期刊>Journal of optical technology >Features of the etching of an yttrium-lithium fluoride crystal in HNO3 solutions
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Features of the etching of an yttrium-lithium fluoride crystal in HNO3 solutions

机译:HNO3溶液中钇-氟化锂晶体蚀刻的特点

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This paper discusses the etching kinetics of a LiYF4:Nd3+ crystal in HNO3 Solutions at various etchant concentrations and temperatures. The etching rates of the crystal along the three principal crystallographic directions are determined. The resulting data make it possible to optimize and control the etching process, which increases the mechanical strength and thermal stability of LiYF4:Nd3+ crystals. (C) 2007 Optical Society of America.
机译:本文讨论了LiYF4:Nd3+晶体在HNO3溶液中不同蚀刻剂浓度和温度下的刻蚀动力学。确定晶体沿三个主要晶体学方向的蚀刻速率。由此产生的数据使优化和控制蚀刻过程成为可能,从而提高了LiYF4:Nd3+晶体的机械强度和热稳定性。(c) 2007年美国光学学会。

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