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Comparative analysis estimates for two-relief microstructure diffraction efficiency in the visible and dual-infrared ranges in the framework of scalar and rigorous diffraction theories

机译:在标量和严谨衍射理论的框架下,可见光和双红外范围内双浮雕微结构衍射效率的比较分析估计

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摘要

Subject of study. The diffraction efficiency of two-layer diffractive microstructures with two sawtooth internal reliefs is studied. Aim of study. The reliability of the results obtained using the scalar approximation is evaluated while considering the actual depths of two sawtooth reliefs (through the effective area method) when designing and calculating microstructures intended for operation in the dual-infrared range, including the mid- and farinfrared radiation subranges (3.4-11.4 mu;m). This is applicable to the selection of optimal pairs of optical materials, estimation of optimal relief depths, and assessment of achievable diffraction efficiency within a given range of angles of incidence of radiation on the microstructure for a chosen relative spatial period of the microstructure. Method. Combined mathematical modeling within the framework of scalar and rigorous diffraction theories is used. Main results. It is demonstrated that, in the dual-infrared range, additional electromagnetic optimization can yield results that significantly differ from those obtained by the effective area method only if the total depth of the reliefs exceeds the average wavelength of the working spectral range by more than an order of magnitude. Practical significance. The presented results offer the potential for a significant reduction in labor costs associated with the design of refractive-diffractive dual-infrared lenses. COPY; 2023 Optica Publishing Group
机译:研究主题。研究了具有两个锯齿内浮雕的双层衍射微观结构的衍射效率。研究目的。在设计和计算用于在双红外范围内操作的微观结构时,在考虑两个锯齿形浮雕的实际深度(通过有效面积法)时,评估使用标量近似获得的结果的可靠性,包括中远红外辐射子范围(3.4-11.4 & μ;这适用于选择最佳光学材料对,估计最佳浮雕深度,以及评估在微结构的选定相对空间周期内微观结构上的辐射入射角范围内可实现的衍射效率。方法。在标量和严格的衍射理论框架内使用组合数学建模。主要结果。结果表明,在双红外范围内,只有当浮雕的总深度超过工作光谱范围的平均波长超过一个数量级时,额外的电磁优化才能产生与有效面积法明显不同的结果。现实意义。所提出的结果提供了显着降低与折射衍射双红外透镜设计相关的劳动力成本的潜力。& 复制;2023 光学出版集团

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