Polarization analyses of aerial images produced by an optical lithography system

摘要

The influence of polarization on the image formation of one-dimensional periodic patterns in a projection optical lithography system has been investigated. Assuming a linear polarizer at the lens pupil, I derived a simple expression representing the image intensity as the summation over spatial-frequency harmonics as well as three orthogonal polarizations. I calculated the coefficient for each image component as a function of the pattern frequency by independently varying the degree of partial coherence such that the image qualities of the two extreme polarization cases could be thoroughly compared. (C) 1998 Optical Society of America. [References: 19]