Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range

摘要

We describe a capillary discharge source configuration, allowing for collection of extreme-ultraviolet (EUV) radiation at large off-axis angles, without the need for an EUV window. Operating with xenon gas, the source emits intensely within the EUV spectral region at 11.3 and 13.5 nm. When coupled with a high-collection-efficiency optical system, this source may be suitable for a number of high-average-power EUV imaging applications.