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DNA-templated nanowires: morphology and electrical conductivity

机译:dna模板纳米线:形态和电导电率

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摘要

DNA-templating has been used to create nanowires from metals, compound semiconductors and conductive polymers. The mechanism of growth involves nucleation at binding sites on the DNA followed by growth of spherical particles and then, under favourable conditions, a slow transformation to a smooth nanowire. The final transformation is favoured by restricting the amount of templated material per unit length of template and occurs most readily for materials of low surface tension. Electrical measurements on DNA-templated nanowires can be facilitated using three techniques: (i) standard current-voltage measurements with contact electrodes embedded in a dielectric so that there is a minimal step height at the dielectric/electrode boundary across which nanowires may be aligned by molecular combing, (ii) the use of a dried droplet technique and conductive AFM to determine contact resistance by moving the tip along the length of an individual nanowire and (iii) non-contact assessment of conductivity by scanned conductance microscopy on Si/SiO2 substrates.
机译:dna模板用于创建纳米线从金属、复合半导体和导电聚合物。包括成核发生在DNA结合位点其次是球形粒子和增长然后,在有利的条件下,一个缓慢转换光滑纳米线。转换是受到限制单位长度上的模板化的材料模板和最容易发生的材料低表面张力。dna模板纳米线可以方便使用三种技术:(i)标准电流电压测量与接触电极嵌入介质,以便有一个最小的一步在电介质/电极高度边界在纳米线可能是一致的分子结合,(2)使用干液滴技术和导电AFM来确定接触电阻通过移动的提示单个纳米线的长度和(iii)非接触式电导的评估扫描电导显微镜Si /二氧化矽基板上。

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