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A centimeter-scale sub-10 nm gap plasmonic nanorod array film as a versatile platform for enhancing light-matter interactions

机译:一个厘米级sub-10纳米电浆奈米棒的差距阵列增强电影作为一个通用的平台件轻松事相互作用

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摘要

Strongly coupled plasmonic nanostructures with sub-10 nm gaps can enable intense electric field enhancements which greatly benefit the various light-matter interactions. From the point view of practical applications, such nanostructures should be of low-cost, facile fabrication and processing, large-scale with high-yield of the ultrasmall gaps, and easy for integration with other functional components. However, nowadays techniques for reliable fabrication of these nanostructures usually involve complex, time-consuming, and expensive lithography procedures, which are limited either by their low-throughput or the small areas obtained. On the other hand, so far most of the studies on the sub-10 nm gap nanostructures mainly focused on the surface-enhanced Raman scattering and high-harmonic generations, while leaving other nonlinear optical properties unexplored. In this work, using a scalable process without any lithography procedures, we demonstrated a centimeter-scale ordered plasmonic nanorod array film (PNRAF) with well-defined sub-10 nm interparticle gaps as a versatile platform for strongly enhanced light-matter interactions. Specifically, we showed that due to its plasmon-induced localized electromagnetic field enhancements, the Au PNRAF could exhibit extraordinary intrinsic multi-photon avalanche luminescence (MAPL) and nonlinear saturable absorption (SA). Furthermore, the PNRAF can be easily integrated with semiconductor quantum dots (SQDs) as well as wide bandgap semiconductors to strongly enhance their fluorescence and photocurrent response, respectively. Our method can be easily generalized to nanorod array films consisting of other plasmonic metals and even semiconductor materials, which can have multiple functionalities derived from different materials. Overall, the findings in our study have offered a potential strategy for design and fabrication of nanostructures with ultrasmall gaps for future photonic and optoelectronic applications.
机译:强耦合电浆纳米结构sub-10纳米缝隙可以使强烈的电场增强各种大大受益件轻松事交互。实际应用,这些纳米结构应的低成本、简单加工和处理、大规模的高收益超小的差距,便于集成其他功能组件。可靠的技术制造的纳米结构通常涉及复杂的,费时和昂贵的光刻技术程序,这是有限的低吞吐量或小地区。另一方面,目前大多数的研究sub-10 nm差距主要集中在纳米结构表面增强拉曼散射谐波的一代,而离开非线性光学性质未知的。使用一个可伸缩的过程没有任何工作光刻过程中,我们演示了一个厘米级命令电浆奈米棒数组电影(PNRAF)定义良好的sub-10海里颗粒间的差距作为一个通用的平台大力加强件轻松事交互。具体来说,我们表明,由于它plasmon-induced局部电磁场增强,非盟PNRAF展览非凡的内在多光子雪崩发光(MAPL)和非线性饱和吸收(SA)。轻松集成与半导体量子点(序列图)以及宽禁带半导体大力增强荧光,分别光电流响应。可以很容易地推广到奈米棒阵列的电影吗其他电浆金属甚至组成半导体材料,它可以有多个功能源自不同的材料。总的来说,在我们的研究结果提供了一个潜在的战略设计和制造的纳米结构与超小差距的未来光子和光电应用程序。

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