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Kinetically-controlled synthesis of ultra-small silica nanoparticles and ultra-thin coatings

机译:Kinetically-controlled合成超小硅纳米颗粒和超薄涂层

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The understanding of silica as a polymer-like globule allows us to synthesize ultra-small silica nanoparticles (NPs) via a kinetic controlled process. The synthetic system is quite simple with Tetraethyl orthosilicate (TESO) as the precursor and H2O as the solvent and reactant. The reaction conditions are gentle with a temperature of around 35 to 60 degrees C with an incubation time of 7-12 hours. The final product of the silica NPs is very uniform and could be as small as 10 nm. The silica NPs can further grow up to 18 nm under the controlled addition of the precursors. Also, these silica NPs can be used as seeds to generate larger silica NPs with sizes ranging from 20 to 100 nm, which can be a useful supplement to the size range made by the traditional Stober method. Moreover, these ultra-small Au NPs can be used as a depletion reagent or as building blocks for an ultrathin silica coating, which has significant applications in fine-tuning the plasmons of AuNPs and thin spacers for surface enhanced spectroscopies.
机译:二氧化硅作为polymer-like的理解球状体允许我们合成超小二氧化硅纳米粒子通过动能(NPs)控制过程。简单的与原硅酸四乙酯(都是)前体和水作为溶剂反应物。大约35 - 60摄氏度的温度7 - 12小时的培养时间。硅NPs非常均匀,的产物可能小到10纳米。进一步控制下长大到18海里添加前体。NPs可以用作种子产生更大硅NPs与大小从20到100海里,这可以是一个有用的补充尺寸范围由传统的长铁楔方法。此外,这些非盟NPs可以用作超小消耗试剂或作为一个构建块超薄硅涂层,意义重大应用程序在微调AuNPs的等离子体和薄垫片表面增强光谱学。

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