In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures

摘要

Three-dimensional (3D) architectures of graphene are of interest in applications in electronics, catalysis devices, and sensors. However, it is still a challenge to fabricate macroscopic all-graphene 3D architectures under mild conditions. Here, a simple method for the preparation of 3D architectures of graphene is developed via the in situ self-assembly of graphene prepared by mild chemical reduction at 95 °C under atmospheric pressure without stirring. No chemical or physical cross-linkers or high pressures are required. The reducing agents include NaHSO3, Na2S, Vitamin C, HI, and hydroquinone. Both graphene hydrogels and aerogels can be prepared by this method, and the shapes of the 3D architectures can be controlled by changing the type of reactor. The 3D architectures of graphene have low densities, high mechanical properties, thermal stability, high electrical conductivity, and high specific capacitance, which make them candidates for potential applications in supercapacitors, hydrogen storage and as supports for catalysts.