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Fabrication and Super Capacitive Performance of Nanoporous Nickel Oxide Film

机译:纳米多孔氧化物膜的制造和超电容性能

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In order to improve the whole performance of a single kinds of materials, the nanoporous nickel (NPN) oxide film was fabricated by the method of interfacial electroless plating. The nickel (Ni) was deposited on the surface of the substrate in three dimensional nanoporous structure, and then the surface layer of Ni is converted into nickel oxide (NiO) after exposure to oxygen in the air. The as-prepared nickel oxide material not only maintains the porous structure of the substrate, but also increases the specific surface area of the material and improves the conductivity, thereby significantly improving the electrochemical capacitance performance of the material which characterized by X-ray diffraction (XRD), scanning electron microscope (SEM) and energy dispersive X-ray spectrometer (EDS). The mass specific capacitance is 387 F g~(-1) and volumetric specific capacitance is 964 F cm~(-3). Therefore, the porous nickel oxide film is an electrode material with great potential for super capacitors.
机译:为了提高单一材料的整体性能,纳米多孔镍(NPN)氧化物膜是通过界面电气板的方法制造的。将镍(Ni)沉积在三维纳米多孔结构中,然后在空气中暴露于氧气后将Ni的表面层转化为氧化镍(NIO)。制备准备的镍氧化物不仅保持底物的多孔结构,而且还增加了材料的特定表面积并提高电导率,从而显着提高了由X射线衍射为特征的材料的电化学电容性能( XRD),扫描电子显微镜(SEM)和能量色散X射线光谱仪(EDS)。质量比电容为387 f g〜(-1),体积比电容为964 f cm〜(-3)。因此,多孔氧化物膜是一种具有巨大潜力超级电容器的电极材料。

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