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Artificial Synapses Based on Ferroelectric Schottky Barrier Field-Effect Transistors for Neuromorphic Applications

机译:基于铁电肖特基屏障场效应晶体管的人工突触,用于神经形态应用

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摘要

Artificial synapses based on ferroelectric Schottky barrier field-effect transistors (FE-SBFETs) are experimentally demonstrated. The FE-SBFETs employ single-crystalline NiSi_(2) contacts with an atomically flat interface to Si and Hf_(0.5)Zr_(0.5)O_(2) ferroelectric layers on silicon-on-insulator substrates. The ferroelectric polarization switching dynamics gradually modulate the NiSi_(2)/Si Schottky barriers and the potential of the channel, thus programming the device conductance with input voltage pulses. The short-term synaptic plasticity is characterized in terms of excitatory/inhibitory post-synaptic current (EPSC) and paired-pulse facilitation/depression. The EPSC amplitude shows a linear response to the amplitude of the pre-synaptic spike. Very low energy/spike consumption as small as ~2 fJ is achieved, demonstrating high energy efficiency. Long-term potentiation/depression results show very high endurance and very small cycle-to-cycle variations (~1%) after 10~(5) pulse measurements. Furthermore, spike-timing-dependent plasticity is also emulated using the gate voltage pulse as the pre-synaptic spike and the drain voltage pulse as the post-synaptic spikes. These findings indicate that FE-SBFET synapses have high potential for future neuromorphic computing applications.
机译:实验证明了基于铁电肖特基势垒场效应晶体管(FE-SBFET)的人工突触。FE-SBFET采用单晶NiSi_2触点,与绝缘体衬底上的硅上的Si和Hf_0.5)Zr_0.5)O_2铁电层具有原子平坦的界面。铁电极化开关动力学逐渐调制NiSi_2)/Si肖特基势垒和沟道电势,从而用输入电压脉冲编程器件电导。短期突触可塑性以兴奋性/抑制性突触后电流(EPSC)和成对脉冲易化/抑制为特征。EPSC振幅与突触前棘波振幅呈线性关系。实现了非常低的能耗/峰值消耗,低至2 fJ,显示出较高的能效。在10~(5)次脉冲测量后,长时程增强/抑制结果显示出很高的持久性和很小的周期间变化(~1%)。此外,还使用门电压脉冲作为突触前棘波,使用漏电压脉冲作为突触后棘波模拟了棘波时间依赖性可塑性。这些发现表明,FE-SBFET突触在未来的神经形态计算应用中具有很高的潜力。

著录项

  • 来源
    《ACS applied materials & interfaces》 |2021年第27期|共8页
  • 作者单位

    Peter Grünberg Institute (PGI 9) and JARA-Fundamentals of Future Information Technologies Forschungszentrum Jülich GmbH;

    Peter Grünberg Institute (PGI 9) and JARA-Fundamentals of Future Information Technologies Forschungszentrum Jülich GmbH;

    Peter Grünberg Institute (PGI 9) and JARA-Fundamentals of Future Information Technologies Forschungszentrum Jülich GmbH;

    Peter Grünberg Institute (PGI 9) and JARA-Fundamentals of Future Information Technologies Forschungszentrum Jülich GmbH;

    Peter Grünberg Institute (PGI 9) and JARA-Fundamentals of Future Information Technologies Forschungszentrum Jülich GmbH;

    Peter Grünberg Institute (PGI 9) and JARA-Fundamentals of Future Information Technologies Forschungszentrum Jülich GmbH;

    Peter Grünberg Institute (PGI 9) and JARA-Fundamentals of Future Information Technologies Forschungszentrum Jülich GmbH;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学工业;
  • 关键词

    synapses; ferroelectric polarization; HZO; single-crystalline NiSilt; subgt; 2lt; /subgt; interface; Schottky barrier; FE-SBFET;

    机译:突触;铁电极化;HZO;单晶NiSi;sub;2/sub;界面肖特基势垒;FE-SBFET;
  • 入库时间 2022-08-20 20:23:42

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