首页> 外文期刊>ACS applied materials & interfaces >Low-Temperature Preparation of Mechanically Robust and Contamination-Resistant Antireflective Coatings for Flexible Polymeric Glasses via Embedding of Silica Nanoparticles and HMDS Modification
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Low-Temperature Preparation of Mechanically Robust and Contamination-Resistant Antireflective Coatings for Flexible Polymeric Glasses via Embedding of Silica Nanoparticles and HMDS Modification

机译:通过嵌入二氧化硅纳米粒子和HMDS改性,对柔性聚合物玻璃的机械鲁棒和抗污垢抗反射涂层的低温制备

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摘要

Mechanical and contamination-resistant properties are the most crucial and challenging issues that impede the practical applications of sol-gel antireflective (AR) coating. In this paper, we report a low-temperature vapor surface treatment strategy for the partial embedding and surface functionalization of silica nanoparticles (SNPs) on flexible polymeric glass substrates. SNPs, which were synthesized via the Stober method, were partially embedded into the polymeric glass substrates by vapor-phase surface treatment using volatile chloroform. Further vapor-phase surface treatments by water and hexamethyldisilazane (HMDS) were applied successively to achieve high trimethylsilyl coverage of the SNPs. The HMDS modification could convert the polar surface of SNPs to a nonpolar surface for contamination resistance, while ammonia, as a byproduct generated, could help to cross-link the SNPs via self-condensation of silanol groups, thus hardening the coating. The SNP-CWH coated polymethylmethacrylate (PMMA) substrate shows an average transmittance of 98.62% in the wavelength region of 400-800 nm, which is 6.32% higher than that of the uncoated bare PMMA. The AR performance of SNP-CWH coated PMMA shows almost no degradation after 100 times of rubbing or bending, indicating the greatly enhanced abrasion resistance and flexibility. Furthermore, the SNP-CWH coating exhibits superior contamination-resistant property, where the transmittance curve of the coated substrate displays a barely noticeable change after exposure to a "dirty" environment with water and organic contaminants for 6 months. This work paves a new way for developing mechanically robust and contamination-resistant AR coating for polymeric substrates.
机译:机械和污染抗性属性是抵抗溶胶 - 凝胶抗反射(AR)涂层的实际应用的最重要和挑战性问题。在本文中,我们报告了柔性聚合物玻璃基板上的硅纳米粒子(SNP)的部分嵌入和表面官能化的低温蒸汽表面处理策略。通过稳定的氯仿通过气相表面处理部分地将其通过级玻璃表面处理成聚合物玻璃基板中的SNP。通过水和六甲基二硅氮烷(HMDS)的进一步气相表面处理依次施加,以实现SNP的高三甲基甲硅烷基覆盖。 HMDS修饰可以将SNP的极性转化为非极性表面以进行污染抗性,而氨作为产生的副产物,可以有助于通过硅烷醇基的自凝块交联SNP,从而使涂层硬化。 SNP-CWH涂覆的聚甲基丙烯酸酯(PMMA)底物显示在400-800nm的波长区域中的平均透射率为98.62%,比未涂布的裸PMMA高6.32%。 SNP-CWH涂层PMMA的AR性能在摩擦或弯曲100倍后几乎没有降解,表明大大提高了耐磨性和柔韧性。此外,SNP-CWH涂层具有优异的污染性能,其中涂覆的基材的透射曲线在暴露于“脏”环境后显示出与水和有机污染物的“脏”环境保持6个月。这项工作为聚合物基材开发机械稳健和耐污染的AR涂层的新方法。

著录项

  • 来源
    《ACS applied materials & interfaces》 |2019年第40期|共10页
  • 作者单位

    Tongji Univ Shanghai Key Lab Special Artificial Microstruct M Shanghai 200092 Peoples R China;

    Tongji Univ Shanghai Key Lab Special Artificial Microstruct M Shanghai 200092 Peoples R China;

    Tongji Univ Shanghai Key Lab Special Artificial Microstruct M Shanghai 200092 Peoples R China;

    Tongji Univ Shanghai Key Lab Special Artificial Microstruct M Shanghai 200092 Peoples R China;

    Tongji Univ Shanghai Key Lab Special Artificial Microstruct M Shanghai 200092 Peoples R China;

    Univ Shanghai Sci &

    Technol Coll Sci Shanghai 200093 Peoples R China;

    Tongji Univ Shanghai Key Lab Special Artificial Microstruct M Shanghai 200092 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学工业;
  • 关键词

    polymeric substrate; embedding; antireflective coating; mechanically robust; contamination-resistant;

    机译:聚合物基材;嵌入;抗反射涂层;机械鲁棒;抗污染;
  • 入库时间 2022-08-20 16:31:33

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