Focused Electron Beam-Induced Deposition and Post-Growth Purification Using the Heteroleptic Ru Complex (eta(3)-C3H5)Ru(CO)(3)Br

摘要

Focused electron beam-induced deposition using the heteroleptic complex (eta(3)-C3H5)Ru(CO)(3)Br as a precursor resulted in deposition of material with Ru content of 23 at. %. Transmission electron microscopy images indicated a nanogranular structure of pure Ru nanocrystals, embedded into a matrix containing carbon, oxygen, and bromine. The deposits were purified by annealing in a reactive 98% N-2/2% H-2 atmosphere at 300 degrees C, resulting in a reduction of contaminants and an increase of the Ru content to 83 at. %. Although a significant volume loss of 79% was found, the shrinkage was observed mostly for vertical thickness (around 75%). The lateral dimensions decreased much less significantly (around 9%). Deposition results, in conjunction with previous gasphase and condensed-phase surface studies on the electron-induced reactions of (eta(3)-C3H5)Ru(CO)(3)Br, provide insights into the behavior of allyl, carbonyl, and bromide ligands under identical electron beam irradiation.