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机译:高温异常霍尔效应在过渡金属二甲基化物铁磁绝缘体异质结构
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
Hong Kong Polytech Univ Dept Appl Phys Hong Kong 999077 Peoples R China;
transition metal dichalcogenides; zirconium ditelluride; anomalous Hall effect; proximity effect; heterostructure interface;
机译:高温异常霍尔效应在过渡金属二甲基化物铁磁绝缘体异质结构
机译:铁磁衬底上2H相M X_2过渡金属二硫化二硅单层的异常霍尔效应(M = Mo,W,X = S,Se,Te)
机译:在铁磁性底物上的2H相MX2过渡金属二甲胺化物单层中的异常霍尔效应(M = Mo,W和X = S,SE,TE)
机译:金属绝缘体在过渡金属二甲基化物中过渡:依赖金属触点
机译:基于贝里相位法的铁电体有限电场和霍尔电导率反常的第一性原理计算。
机译:拓扑绝缘体-铁磁体层异质结构中的单向自旋霍尔和Rashba-Edelstein磁阻
机译:2 $ H $ - 相过渡金属二硫化物的异常霍尔效应 铁磁性基底上的单层膜