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Growth and property analysis of large-area epitaxial Tl-2212 high temperature superconducting films

机译:大面积外延TL-2212高温超导薄膜的生长和性能分析

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摘要

The extensive use of large-area high temperature superconducting (HTS) thin films has emerged in superconducting microwave devices. The interest in Tl-based HTS films arises from their high critical temperature (T-c), allowing the microwave device made on Tl films to work above the liquid nitrogen temperature zone. Here, we introduce a simplified two-step method to fabricate high-quality Tl2Ba2CaCu2O8 (Tl-2212) films on 2-inch LaAlO3 substrates. This method enables the preparation of Tl-2212 films to be easy and repeatable, promoting the theoretical research and practical applications of Tl-based films. Based on the high reproducibility of this fabricating process, we studied the superconducting properties of T-c, the critical current density J(c) (77 K, zero field) and surface resistance (R-s) of 2-inch Tl-2212 films. Results show that the T-c values of the sample films prepared at different conditions vary from 99 K to 103 K, depending on the oxygen content; the J(c) of the films ranges from 0.7 to 1.8 MA/cm(2), relying on the surface roughness. On the basis of the two-fluid model, the influence of J(c) on R-s of the Tl-2212 films is incorporated to explain the variation of R-s in different samples.
机译:超导微波器件中出现了大面积高温超导(HTS)薄膜的广泛使用。基于TL的HTS膜的兴趣来自其高临界温度(T-C),允许在TL膜上制造的微波器件在液氮温度区上方工作。在这里,我们介绍了一种简化的两步方法,用于在2英寸Laalo3基板上制造高质量的TL2BA2CAC2O8(TL-2212)薄膜。该方法使得能够制备TL-2212薄膜,易于可重复,促进基于TL的薄膜的理论研究和实际应用。基于该制造过程的高再现性,我们研究了T-C的超导特性,临界电流密度J(C)(77K,零场)和2英寸TL-2212膜的表面电阻(R-S)。结果表明,根据氧含量,在不同条件下制备的样品膜的T-C值在99k至103k之间变化;薄膜的J(c)的范围为0.7至1.8 mA / cm(2),依靠表面粗糙度。在双流体模型的基础上,掺入了TL-2212膜的R-S对R-S的影响,以解释不同样品中R-S的变化。

著录项

  • 来源
    《CERAMICS INTERNATIONAL》 |2019年第1期|共7页
  • 作者单位

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Univ Elect Slcience &

    Technol Sch Optoelect Informat Chengdu 610054 Sichuan Peoples R China;

    Nankai Univ Coll Elect Informat &

    Opt Engn Tianjin 300350 Peoples R China;

    Nankai Univ Sch Phys Tianjin 300350 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 陶瓷工业;硅酸盐工业;
  • 关键词

    Tl-2212 films; Critical temperature; Critical current density; Microwave surface resistance;

    机译:TL-2212薄膜;临界温度;临界电流密度;微波表面电阻;

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