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Nanostructured TaC film deposited by reactive magnetron sputtering: Influence of gas concentration on structural, mechanical, wear and corrosion properties

机译:反应磁控溅射沉积的纳米结构TAC膜:气体浓度对结构,机械,磨损和腐蚀性能的影响

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摘要

TaC coatings were applied on the surface of the AISI316L stainless steel by reactive magnetron sputtering, and the effects of CH4 concentrations (C-CH4 = 0, 5, 10, 20 and 30) on the structural, mechanical, wear and corrosion behavior were investigated. According to the dominant phase structure, deposited films classified into three categories; namely, metallic (Ta phase), ceramic (TaC phase) and amorphous (amorphous carbon phase). Increasing the C-CH4, from 0% to 20%, hardness (H) and elastic modulus (E) of the coatings increased from 6.2 and 115.6 GPa to 27.6 and 274.2 GPa, respectively. Further increase in C-CH4 led to decrease H and E to 1.5 and 16.3 GPa, respectively. Based on nanoindentation and pin on disk test results, in ceramic coatings due to high coating to substrate hardness ratio, the resistance of the coating against elastic (H/E) and plastic (H-3/E-2) deformation are the key factors in the determination of wear behavior. It is to say, the coating deposited at C-CH4 = 20% showing the H/E = 0.101 and H-3/E-2 = 0.28 had the highest wear resistance, while the coating deposited at C-CH4 = 10% with the H/E = 0.068 and H-3/E-2 = 0.084 showed the lowest wear resistance. Tafel and electrochemical impedance spectroscopy (EIS) tests were also used to investigate the corrosion behavior of the samples. Results showed that the films deposited at C-CH4 = 5 and 10% display the best protective properties, which was attributed to lower porosity index.
机译:通过反应磁控溅射施加在AISI316L不锈钢表面上的TAC涂层,研究了CH4浓度(C-CH4 = 0,5,10,20和30)对结构,机械,磨损和腐蚀行为的影响。根据主要的相位结构,沉积薄膜分为三类;即金属(Ta相),陶瓷(TAC相)和无定形(无定形碳相)。增加C-CH4,从0%至20%,硬度(H)和涂层的弹性模量(E)分别从6.2和115.6GPa增加到27.6和274.2GPa。 C-CH4的进一步增加,分别降低H和E至1.5和16.3GPa。基于纳米狭窄和销钉上的盘试验结果,在陶瓷涂层由于高涂层对基底硬度比而言,涂层对弹性(H / E)和塑料(H-3 / E-2)变形的影响是关键因素在确定磨损行为。就是说,在C-CH 4 = 20%沉积的涂层显示H / E = 0.101和H-3 / E-2 = 0.28具有最高的耐磨性,而在C-CH4℃沉积的涂层= 10% H / E = 0.068和H-3 / E-2 = 0.084显示出最低的耐磨性。 TAFEL和电化学阻抗光谱(EIS)测试还用于研究样品的腐蚀行为。结果表明,在C-CH4 = 5和10%沉积的薄膜显示出最佳的保护性能,其归因于较低的孔隙度指数。

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