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Preparation and characterization of Ni-AlN nanocoatings deposited by magnetic field assisted electrodeposition technique

机译:磁场辅助电沉积技术沉积Ni-Aln纳米孔的制备与表征

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摘要

In this study, traditional nickel coating and Ni-AlN nanocoatings were deposited on mild steel surfaces using magnetic field-assisted electrodeposition (MFAED) technique. Microstructures, compositions, and microhardness values of nanocoatings were examined by digital holographic microscopy (DHM), scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD). The microhardness, wear, and corrosion properties of nanocoatings were also examined. The nanocoating prepared at 0.4 T (abbreviated as S-0.4) showed uniform and compact structure with AlN and Ni sizes around 42.7 nm and 84.2 nm, respectively. Diffraction peaks of nickel grains became broader and lower in intensity as magnetic field rose from 0.2 T to 0.4 T, indicating nickel grains refinement in S-0.4 nanocoating. Among three coatings, S-0.4 nanocoating exhibited the highest microhardness with average value of 846.2 Hv and lowest mass loss of 46.4 mg. By comparison, S-0 coating exhibited the highest mass loss with average value of 95.7 mg. S-0.4 nanocoating exhibited the minimum corrosion current density of 0.35 x 10(-4) A/cm(2), demonstrating the best corrosion resistance among all three coatings.
机译:在该研究中,使用磁场辅助电沉积(MFAED)技术在温和的钢表面上沉积了传统的镍涂层和Ni-Aln纳米织物。通过数字全息显微镜(DHM),扫描电子显微镜(SEM),透射电子显微镜(TEM)和X射线衍射(XRD)检查纳米织物的微观结构,组合物和显微硬度值。还检查了纳米织物的微硬度,磨损和腐蚀性。在0.4 t(缩写为S-0.4)时制备的纳米核性显示出均匀且紧凑的结构,分别具有约42.7nm和84.2nm的Aln和Ni尺寸。镍晶粒的衍射峰变得更宽,强度较低,因为磁场从0.2℃上升到0.4吨,表示S-0.4纳米核中的镍晶粒细化。在三个涂层中,S-0.4纳米核化性显示出最高的微硬度,平均值为846.2HV,最低质量损失为46.4mg。相比之下,S-0涂层表现出最高质量损失,平均值为95.7毫克。 S-0.4纳米陶瓷表现出0.35×10(4)A / cm(2)的最小腐蚀电流密度,证明了所有三种涂层之间的最佳耐腐蚀性。

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