High-rate deposition of protective alumina films by means of reactive magnetron spraying

S.P.Bugaev; A.N.Zakharov

首页> 外文期刊>Физикаи　химия　обработки　материалов >High-rate deposition of protective alumina films by means of reactive magnetron spraying

【24h】

High-rate deposition of protective alumina films by means of reactive magnetron spraying

机译：通过反应磁控膜喷涂的保护性氧化铝膜的高速率沉积

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Structure and optical properties ofreactive magnetron sputtered films of aluminum oxidehave been investigated. The film deposition rate wasabout 100nm/min. The coatings had an amorphousstructure and its microhardness was 960 kg/mm2.

机译：研究了氧化铝溅射膜的反应磁控膜的结构和光学性能。薄膜沉积速率是100nm / min。涂层具有神经结构，其微硬度为960kg / mm 2。

著录项

来源
《Физикаи　химия　обработки　материалов》 |1999年第2期|共4页
作者
S.P.Bugaev; A.N.Zakharov;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 rus
中图分类工程材料学;
关键词
保护膜; 氧化铝; 高速淀积; 反应磁控管;

机译：保护膜;氧化铝;高速淀积;反应磁控管;

相似文献

外文文献
中文文献
专利

1. High-rate deposition of protective alumina films by means of reactive magnetron spraying [J] . S.P.Bugaev, A.N.Zakharov Физикаи　химия　обработки　материалов . 1999,第2期

机译：通过反应磁控膜喷涂的保护性氧化铝膜的高速率沉积
2. High-rate deposition of Ta-doped SnO_2 films by reactive magnetron sputtering using a Sn-Ta metal-sintered target [J] . Y. Muto, S. Nakatomi, N. Oka, Thin Solid Films . 2012,第10期

机译：利用Sn-Ta金属烧结靶通过反应磁控溅射高速沉积Ta掺杂的SnO_2薄膜
3. High-rate deposition of high-quality Sn-doped In_2O_3 films by reactive magnetron sputtering using alloy targets [J] . Nobuto Oka, Yukari Kawase, Yuzo Shigesato Thin Solid Films . 2012,第12期

机译：使用合金靶材通过反应磁控溅射高速沉积高质量的Sn掺杂In_2O_3薄膜
4. High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering [C] . J. Vlcek, J. Rezek, J. Lazar, Society of Vacuum Coaters annual technical conference . 2011

机译：高功率脉冲直流磁控溅射对二氧化锆透明膜的高反应性沉积
5. Chromium nitride and chromium aluminum nitride epitaxial films for growth of alpha-alumina by AC reactive magnetron sputtering. [D] . Pulugurtha, Syamala Rani. 2007

机译：氮化铬和氮化铬铝外延膜，用于通过AC反应磁控溅射法生长α-氧化铝。
6. Deposition of Visible Light Active Photocatalytic Bismuth Molybdate Thin Films by Reactive Magnetron Sputtering [O] . Marina Ratova, Peter J. Kelly, Glen T. West, 2016

机译：磁控溅射沉积可见光活性光催化钼酸铋薄膜
7. High-rate deposition of stoichiometric compounds by reactive magnetron sputtering at oblique angles [O] . Álvarez, Rafael, García-Valenzuela, A., López-Santos, Carmen, 2017

机译：反应磁控溅射在倾斜角度下高化学计量化合物的沉积

High-rate deposition of protective alumina films by means of reactive magnetron spraying

摘要

著录项

相似文献

相关主题

期刊订阅