首页> 外文期刊>材料試験技術 >Effects of oxide film on solderability of copper alloy for lead-frames
【24h】

Effects of oxide film on solderability of copper alloy for lead-frames

机译:氧化膜对铅框架铜合金可焊性的影响

获取原文
获取原文并翻译 | 示例
       

摘要

Factors affecting the growth of copper oxide film on the surface of a copper strip, and the effect of this film on solderability were investigated using an optimized cathodic reduction technique that permits easy measurement of thickness of copper oxide film. Humidity was found to be the most important factor affecting the growth of copper oxide film. At room temperature, copper oxide film grew slowly under low humidity conditions, but grew quickly as relative humidity increased. The resultingcopper oxide film adversely effected the solderability of the copper strip, especially when non-flux soldering was used. When the thickness of the copper oxide film exceeded 6nm, solderability was severely lowered. Good solderability of the coppersurface can be maintained by limiting the growth of the copper oxide film to 6 nm. The thickness of the oxide film obtained by the present cathodic reduction method was in good agreement with that determined by AF~ analysis, especially when the oxidethickness is less than 10nm.
机译:利用优化的阴极还原技术研究了影响铜带表面上的铜带表面上铜膜的生长的因素,以及该薄膜对可焊性的影响,允许易于测量氧化铜膜的厚度。发现湿度是影响氧化铜膜生长的最重要因素。在室温下,氧化铜膜在低湿度条件下慢慢增长,但随着相对湿度的增加而迅速增长。结果氧化物膜对铜带的可焊性产生不利影响,特别是当使用非助焊剂焊料时。当氧化铜膜的厚度超过6nm时,可焊性严重降低。通过将氧化铜膜的生长限制为6nm,可以维持Coppersurface的良好可焊性。通过本阴极还原方法获得的氧化膜的厚度与AF〜分析确定的良好一致,特别是当氧化含量小于10nm时。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号