ICP/MS Technology Parts-per-quadrillion sensitivity reveals miniscule markers, from those created by nuclear blasts to trace impurities in pharmaceuticals

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ICP/MS Technology Parts-per-quadrillion sensitivity reveals miniscule markers, from those created by nuclear blasts to trace impurities in pharmaceuticals

机译：ICP / MS技术的百万分之几的灵敏度揭示了微弱的标记物，从核爆炸产生的痕迹到痕量药物中的杂质

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来源
《American laboratory》 |2016年第9期|共3页
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May Mike;
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正文语种 eng
中图分类化学;生物科学;
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1. ICP/MS Technology Parts-per-quadrillion sensitivity reveals miniscule markers, from those created by nuclear blasts to trace impurities in pharmaceuticals [J] . May Mike American laboratory . 2016,第9期

机译：ICP / MS技术的百万分之几的灵敏度揭示了微弱的标记物，从核爆炸产生的痕迹到痕量药物中的杂质
2. Micro-sampling, high sensitivity ETV-ICP-MS method for the determination of trace rare earth impurities in high purity lanthanum oxide [J] . Yin J, Hu B, He M, Atomic Spectroscopy . 2005,第5期

机译：微量进样高灵敏度ETV-ICP-MS法测定高纯氧化镧中的痕量稀土杂质
3. Determination of critical trace impurities in 'uranium silicide dispersed in aluminium' nuclear fuel by inductively coupled plasma mass spectrometry (ICP-MS) [J] . Abhijit Saha, Khushboo Kumari, Sadhan Bijoy Deb, Journal of Analytical Atomic Spectrometry . 2021,第3期

机译：电感耦合等离子体质谱（ICP-MS）测定铝核燃料中硅化物中硅化物硅化物中硅化物中的临界痕量杂质
4. Determination of elemental impurities in active pharmaceuticals by single ICP-MS run after prior stabilisation of osmium [C] . Denis Besic, Irena Raic, Ernest Mestrovic, International Mass Spectrometry Conference . 2014

机译：在锇稳定后通过单ICP-MS测定活性药物中的元素杂质
5. Determination of Trace Impurities in Germanium Dioxide by ICP-OES, ICP-MS and ETAAS after Matrix Volatilization: A Long-run Performance of the Method [O] . Matti NIEMELÄ, Harri KOLA, Paavo PERÄMÄKI 2014

机译：基质挥发后ICP-OES，ICP-MS和ETAAs测定二氧化锗中的痕量杂质：方法的长期性能

ICP/MS Technology Parts-per-quadrillion sensitivity reveals miniscule markers, from those created by nuclear blasts to trace impurities in pharmaceuticals

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