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首页> 外文期刊>Current applied physics: the official journal of the Korean Physical Society >Electrical characterization of a-axis oriented Y123 thin film grown using pulsed laser deposition
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Electrical characterization of a-axis oriented Y123 thin film grown using pulsed laser deposition

机译:使用脉冲激光沉积生长的a轴取向Y123薄膜的电学表征

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摘要

The thin film of a-axis oriented YBa_2Cu_3O_7 (Y123) were grown on SrLaGaO_4 (100) substrate with a buffer layer of 50 nm thick Gd_2CuO_4 using pulsed laser deposition technique. The thickness of Y123 thin film is about 400 nm CuO_2 planes are aligned perpendicular to the substrate in the thin films. A micron-bridge was fabricated using focused ion beam milling technique in such a way that the current was forced to flow along the c-axis in thin film. Intrinsic Josephson junctions are aligned along the c-axis. The dimensions of bridge are 1 μm in length along the c-axis and 5 μm in width along the b-axis. Transition temperature (T_(cON)) is about 84 K with single phase. The critical current density (J_c) of 2 × 10~6 A/cm ~2 was measured from current-voltage (I-V) characteristics at 10 K. The samples were irradiated with external microwave of 20 GHz at different power and the J_c was suppressed as we increased the power. This suppression in J_c indicates the formation of layered structure with strong coupling. The voltage steps are appeared in non-linear I-V characteristics with microwave irradiation. The voltage steps are collective response of intrinsic Josephson junctions of micron-bridge.
机译:使用脉冲激光沉积技术,在具有50 nm厚Gd_2CuO_4缓冲层的SrLaGaO_4(100)衬底上生长a轴取向的YBa_2Cu_3O_7(Y123)薄膜。 Y123薄膜的厚度为大约400nm,CuO_2平面垂直于薄膜中的衬底排列。使用聚焦离子束研磨技术以使电流被迫沿着c轴在薄膜中流动的方式制造了微米桥。固有的约瑟夫森结沿c轴对齐。桥的尺寸沿c轴的长度为1μm,沿b轴的宽度为5μm。单相转变温度(T_(cON))约为84K。从10 K下的电流-电压(IV)特性测量出2×10〜6 A / cm〜2的临界电流密度(J_c)。以20 GHz的外部微波以不同的功率照射样品,并抑制了J_c随着功率的增加J_c的这种抑制表明形成了具有强耦合的分层结构。在微波辐照下,电压阶跃以非线性I-V特性出现。电压阶跃是微米桥本征约瑟夫森结的集体响应。

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