Formation of Gradient Multiwalled Carbon Nanotube Stripe Patterns by Using Evaporation-Induced Self-Assembly

摘要

Gradient stripe patterns of multiwalled carbon nanotubes (MWCNTs) with remarkable regularity over large areas were fabricated by using evaporation-induced self-assembly technique. In this method, a glass coverslip was inclinedly immersed into a suspension of MWCNTs in dichloroethane. By controlling the solvent evaporation temperature, well-defined gradient stripes were formed at the air—solvent—substrate contact line. The effects of several experimental parameters, such as the substrate tilt angle, concentration of MWCNTs, and evaporation temperature, on the regularity of stripes were discussed. A possible stripe formation process was described as a negative feedback of MWCNT concentration caused by a concavely curved shape of the meniscus. Additionally, the strips of MWCNTs on Si/SiO2 substrate were directly used to fabricate field-effect transistor (FET) devices. The electrical properties of the MWCNT-FET devices were also investigated.