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Synthesis of Large-Area Highly Crystalline Monolayer Molybdenum Disulfide with Tunable Grain Size in a H-2 Atmosphere

机译:H-2气氛中可调节粒径的大面积高结晶度单层二硫化钼的合成

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摘要

Large-area and highly crystalline monolayer molybdenum disulfide (MoS2) with a tunable grain size was synthesized in a H-2 atmosphere. The influence of introduced H-2 on MoS2 growth and grain size, as well as the corresponding mechanism, was tentatively explored by controlling the H-2 flow rate. The as-grown monolayer MoS2 displays excellent uniformity and high crystallinity evidenced by Raman and high-resolution transmission electron microscopy. The Raman results also give an indication that the quality of the monolayer MoS2 synthesized in a H-2 atmosphere is comparable to that synthesized by using seed or mechanical exfoliation. In addition, the electronic properties and dielectric inhomogeneity of MoS2 monolayers were also detected in situ via scanning microwave microscopy, with measurements on impedance and differential capacitance (dC/dV). Back-gated field-effect transistors based on highly crystalline monolayer MoS2 shows a field-effect mobility of similar to 13.07 cm(2) V-1 s(-1) and an I-on/I-off ratio of similar to 1.1 x 10(7), indicating that the synthesis of large-area and high-quality monolayer MoS2 with H-2 is a viable method for electronic and optoelectronic applications.
机译:在H-2气氛中合成了粒径可调的大面积高结晶度单层二硫化钼(MoS2)。通过控制H-2流量,初步探索了引入的H-2对MoS2生长和晶粒尺寸的影响以及相应的机理。生长的单层MoS2显示出出色的均匀性和高结晶度,这是通过拉曼光谱仪和高分辨率透射电子显微镜证明的。拉曼结果还表明,在H-2气氛中合成的单层MoS2的质量与使用种子或机械剥离法合成的单层MoS2的质量相当。此外,还通过扫描微波显微镜原位检测了MoS2单层的电子性质和介电不均匀性,并测量了阻抗和差分电容(dC / dV)。基于高度结晶的单层MoS2的背栅场效应晶体管显示的场效应迁移率接近13.07 cm(2)V-1 s(-1),I-on / I-off比接近1.1 x如图10(7)所示,表明用H-2合成大面积高质量的单层MoS 2是用于电子和光电应用的可行方法。

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