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首页> 外文期刊>Journal of the Taiwan Institute of Chemical Engineers >Dip-coating synthesis of P-doped BiVO4 photoanodes with enhanced photoelectrochemical performance
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Dip-coating synthesis of P-doped BiVO4 photoanodes with enhanced photoelectrochemical performance

机译:具有增强的光电化学性能的P掺杂BIVO4光桥浸涂合成

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摘要

The application of bismuth vanadate for photoelectrochemical water splitting is limited by the insufficient charge separation and transport characteristics. In this work, phosphorus doped BiVO4 (P-BiVO4) photoanodes were fabricated through dip-coating method and subsequent thermal treatment process. The optimized 2% P-BiVO4 exhibited a photocurrent density up to 0.28 mA/cm(2) at 1.23 V versus reversible hydrogen electrode in 0.5 M Na2SO4 electrolyte (AM 1.5 G, 100 mW/cm(2)). The incident photon-to-current efficiency of 2% P-BiVO4 was boosted to 33%, which was significantly higher than the pristine BiVO4 photoanode. The X-ray photoelectron spectra indicate that the P-BiVO4 possessed abundant oxygen vacancies, which can account for enhancing PEC performance of P-BiVO4. The electrochemical impedance spectroscopy and Mott-Schottky results further show that P-BiVO4 possess less interface obstruction and high carrier concentration, which were beneficial for the improvement of photoelectrochemical performance. This work provides a useful guidance for the design of non-metal doped BiVO4 photoanodes for energy conversion. (C) 2018 Published by Elsevier B.V. on behalf of Taiwan Institute of Chemical Engineers.
机译:铋钒酸盐用于光电化学水分子的应用受到电荷分离和运输特性不足的限制。在这项工作中,通过浸涂法制造磷掺杂的Bivo4(P-BIVO4)光桥和随后的热处理过程。优化的2%p-BIVO4在0.5M Na 2 SO 4电解质中,在1.23V的比较为0.28mA / cm(2)的光电流密度高达0.28mA / cm(2)(AM 1.5g,100mW / cm(2))。将2%p-bivo4的事件的光子至电流效率提高至33%,显着高于原始Bivo4光电码。 X射线光电子体光谱表明P-BIVO4具有丰富的氧空位,这可以考虑增强P-BIVO4的PEC性能。电化学阻抗光谱和MOTT-Schottky结果进一步表明p-bivo4具有较少的界面阻塞和高载体浓度,这对改善光电化学性能有益。这项工作为设计的非金属掺杂BIVO4光电码提供了有用的指导。 (c)2018由elsevier b.v出版。代表台湾化学工程师研究所。

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