Proposal for a photoelectron spectroscopy and microscopy beamline (0.5-11keV) at the High Energy Photon Source

摘要

An optical design study of a beamline proposed for the new 6GeV synchrotron, the High Energy Photon Source (HEPS), to be built in Beijing, China, is described. The beamline is designed to cover an energy range from 0.5 to 11keV with two experimental stations, one for X-ray photoelectron spectroscopy (PES) experiments and the other for photoelectron emission microscopy (XPEEM) experiments. A 5m APPLEII-type undulator with a relatively long magnetic period (55mm) is used as the only radiation source. To optimize the optical efficiency for the full energy range, the beamline is split into a soft X-ray branch that is based on a variable-line-spacing plane-grating monochromator and a tender X-ray branch that uses a four-bounce monochromator with three Si channel-cut pairs. To allow both PES and XPEEM to be performed over the entire energy range, two toroidal mirrors and a bendable KB mirror pair are employed to deliver the soft and tender beams, respectively, to either of two experimental stations.