Development of continuous metal patterns using two-dimensional atmospheric-pressure plasma-jet: on application to fabricate electrode on a flexible surface for film touch sensor

摘要

A two-dimensional atmospheric-pressure plasma jet (2D-APPJ) was developed for photoresist residual layer removal, which is essential for the continuous and uniform fabrication of large-area micro/nanoelectronics via continuous-imprinting lithography. To verify the feasibility of the developed method, the electrode structure for a capacitive-type film touch sensor was continuously fabricated using a combination of the developed 2D-APPJ and a roll-to-roll imprinting method. As a result of applying the process conditions confirmed through system design, fabrication, and parametric study, photoresist removal up to 4917 angstrom with a uniformity of 7.8% was achieved in the APPJ sample scanning at a scan speed of 1 mm s(-1). Using the developed APPJ process, a double-layer electrode consisting of Cu and indium tin oxide with a minimum line width of 10 mu m was successfully patterned by employing the auto-alignment process using a double-step etch barrier.