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首页> 外文期刊>AIChE Journal >Stable Equilibrium Shift of Methane Steam Reforming in Membrane Reactors with Hydrogen-selective Silica Membranes
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Stable Equilibrium Shift of Methane Steam Reforming in Membrane Reactors with Hydrogen-selective Silica Membranes

机译:含氢选择性二氧化硅膜的膜反应器中甲烷蒸汽重整的稳定平衡转变

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摘要

Equilibrium shifts of methane steam reforming in membrane reactors consisting of either tetramethoxysilane-derived amorphous hydrogen-selective silica membrane and rhodium catalysts, or hexamethyldisiloxane-derived membrane and nickel catalysts is experimentally demonstrated. The hexamethyldisiloxane-derived silica membrane showed stable permeance as high as 8 x 10~(-8) mol m~(-2) s~(-1) Pa~(-1) of H2 after exposure to 76 kPa of vapor pressure at 773 K for 60 h, which was a much better performance than that from the tetramethoxysilane-derived silica membrane. Furthermore, the better silica membrane also maintained selectivity of H2/N2 as high as 10~3 under the above hydrothermal conditions. The degree of the equilibrium shifts under various feedrate and pressure conditions coincided with the order of H2 permeance. In addition, the equilibrium shift of methane steam reforming was stable for 30 h with an SIC ratio of 2.5 at 773 K using a membrane reactor integrated with hexamethyldisiloxane-derived membrane and nickel catalyst.
机译:实验证明了由四甲氧基硅烷衍生的无定形氢选择性二氧化硅膜和铑催化剂,或六甲基二硅氧烷衍生的膜和镍催化剂组成的膜反应器中甲烷蒸汽重整的平衡转变。六甲基二硅氧烷衍生的二氧化硅膜在暴露于76 kPa的蒸气压下时,具有稳定的磁导率,高达8 x 10〜(-8)mol m〜(-2)s〜(-1)Pa〜(-1)的H2。 773 K 60 h,其性能要比四甲氧基硅烷衍生的二氧化硅膜好得多。此外,较好的二氧化硅膜在上述水热条件下还保持了H2 / N2的选择性高达10〜3。在各种进给速度和压力条件下,平衡位移的程度与H2渗透率的顺序一致。此外,使用集成了六甲基二硅氧烷衍生膜和镍催化剂的膜反应器,甲烷蒸汽重整的平衡位移在773 K下的SIC比为2.5的情况下稳定了30小时。

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