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Vapor annealing synthesis of non-epitaxial MgB2 films on glassy carbon

机译:玻璃碳上非外延MgB2薄膜的蒸汽退火

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We describe the fabrication and characterization of 25-800 nm thick MgB2 films on glassy carbon substrates by Mg vapor annealing of sputter-deposited amorphous B films. Results demonstrate a critical role of both the initial B film thickness and the temperature-time profile on the microstructure, elemental composition, and superconducting properties of the resultant MgB2 films. Films with thicknesses of 55 nm and below exhibit a smooth surface, with a roughness of 1.1 nm, while thicker films have surface morphology consisting of elongated nano-crystallites. The suppression of the superconducting transition temperature for thin films scales linearly with the oxygen impurity concentration and also correlates with the amount of lattice disorder probed by Raman scattering. The best results are obtained by a rapid (12 min) anneal at 850 degrees C with large temperature ramp and cooling rates of similar to 540 degrees C min(-1). Such fast processing suppresses the deleterious oxygen uptake.
机译:通过Mg蒸汽退火对溅射无定形B膜的Mg蒸汽退火描述了25-800nm厚的MgB2薄膜的制造和表征。 结果证明了初始B膜厚度和温度 - 时间谱对所得MGB2膜的微结构,元素组成和超导性能的关键作用。 厚度为55nm和以下的薄膜表现出光滑的表面,粗糙度为1.1nm,而厚膜具有由细长的纳米微晶组成的表面形态。 抑制薄膜的超导转变温度与氧气杂质浓度线性缩放,也与拉曼散射探测的晶格障碍的量相关。 最佳结果是通过快速(12分钟)退火在850℃下获得,温度斜坡和冷却速率类似于540摄氏度(-1)。 这种快速处理抑制了有害的氧气吸收。

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