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首页> 外文期刊>Nanoscience and Nanotechnology Letters >Graphene Quantum Dots Incorporated SnO2 Composites with Improved Photoelectric Properties
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Graphene Quantum Dots Incorporated SnO2 Composites with Improved Photoelectric Properties

机译:石墨烯量子点掺入了具有改善的光电性能的SnO2复合材料

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SnO2 based composites were prepared in this study via solvothermal method, using SnCl4 center dot 5H(2)O as Sn precursors and micrometer or nanometer-sized graphene as supports. Micrometer-sized graphene sheets were cut into nanometer-sized graphene quantum dots had interlamellar spacing of 0.34 nm and 0.24 nm attributed to (002) and (1120) crystal facets of graphene quantum dots. GQDs attached SnO2 composites presented with interlamellar spacing of 0.35 nm and 0.26 nm, designated to the (110) and (101) crystal facets of SnO2. The incorporation of SnO2 with GQDs led to decreased zeta potential from 12.99 to -7.2 mV, due to electrostatic interaction between positively charged SnO2 and highly negative GQDs. The performances of SnO2 based composites were investigated by photocurrent-time and electrochemical impedance measurements. The SnO2/graphene quantum dots composites presented higher photocurrent density and lower charge-transfer resistance in comparison with SnO2/graphene composites. The photocurrent response of the former was about four times higher than that of the latter, which indicated that the incorporation of graphene quantum dots decreased conductive distance, inhibiting charge recombination and improving electron transfer.
机译:通过SnCl4中央点5h(2)O作为Sn前体和千分尺或纳米尺寸的石墨烯作为支撑,在该研究中制备了基于SnO 2的复合材料。将微米尺寸的石墨烯片切割成纳米大小的石墨烯量子点具有0.34nm的层间间距,归因于(002)和(1120)石墨烯量子点的晶面。 GQDS连接的SNO2复合材料具有0.35nm和0.26nm的层间间距,指定为SNO2的(101)和(101)的晶面。由于带正电荷的SnO2和高负GQD之间的静电相互作用,将SnO2与GQD掺入12.99至-7.2 mV的Zeta电位降低。通过光电流 - 时间和电化学阻抗测量研究了基于SnO2基复合材料的性能。与SnO2 /石墨烯复合材料相比,SnO2 /石墨烯量子点复合材料呈现更高的光电流密度和较低的电荷 - 转移电阻。前者的光电流响应比后者的光电流响应大约四倍,表明石墨烯量子点的掺入降低导电距离,抑制电荷重组和改善电子转移。

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