Wettability property of CNT-graphene like film deposited by microwave plasma enhanced vapor deposition technique

摘要

Wettability property of carbon nano-tubes (CNT)-graphene like films have been investigated. In this work, we have studied the wettability of CNT-graphene like film deposited on Ni substrate by Microwave Plasma Enhanced vapor deposition Technique (MWPECVD). Compared to the water contact angles of 77.8 degrees for bare Ni substrate, the water contact angle of the CNT-graphene like hybrid films is found to be 128.4 degrees. The nanostructures have been deposited at fixed pressure of 20Torr with different temperature of 500, 600 and 700 degrees C. The results indicate that wettability properties of nano-structure can be tailored, significantly. The solid surface energy (SE) of composite films was estimated using contact angle measurements. The wettability of CNT-graphene has been studied first time in film form.