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A long pulse width and high extraction rate arc plasma electron beam source

机译:长脉冲宽度和高提取率电弧等离子体电子束源

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摘要

Based on the principle of vacuum arc discharge under magnetic field, a novel plasma cathode electron- beam source was designed. This device can be used to regulate electron-beam current so as to improve the extrication efficiency of electron beam through regulating the exciting current and thus controlling the density of the plasma electron beam source. Experiment results showed that the arc current change with the magnetic field, to be specific, the stronger the magnetic field was, the smaller the arc current will be, then the density of plasma that penetrated the anode hole to serve as electron beam will be higher. From this experiment, it can be seen that under the condition of 10(-3) Pa air pressure, 100 V arc voltage, 30 A exciting current, we can obtain the electron beam of 40 ms pulse width, and 828 mA current in the extraction rate of 6.1%.
机译:基于磁场下真空电弧放电原理,设计了一种新型等离子体阴极电子束源。 该装置可用于调节电子束电流,以提高电子束的提高效率,通过调节激励电流,从而控制等离子体电子束源的密度。 实验结果表明,磁场磁场的电弧电流变化,磁场越强,电弧电流越小,那么穿透阳极孔的等离子体密度将更高 。 从这个实验中,可以看出,在10(-3)PA气压的条件下,100V电弧电压,30个激励电流,我们可以获得40 ms脉冲宽度的电子束,而828 mA电流 提取率为6.1%。

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    Wuhan Univ Sch Elect Engn Wuhan 430072 Hubei Peoples R China;

    Wuhan Univ Sch Elect Engn Wuhan 430072 Hubei Peoples R China;

    Wuhan Univ Sch Elect Engn Wuhan 430072 Hubei Peoples R China;

    Wuhan Univ Sch Elect Engn Wuhan 430072 Hubei Peoples R China;

    Wuhan Univ Sch Elect Engn Wuhan 430072 Hubei Peoples R China;

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