Corrosion protection and mechanical performance of SiO{sub}2 films deposited via PECVD on OT59 brass

摘要

Purpose - To evaluate the corrosion performance and nano-mechanical behaviour of a brass substrate covered by different thick SiO{sub}2 layers deposited by means of plasma enhanced chemical vapour deposition (PECVD) technique. Design/methodology/approach - The comparison between laboratory and "industrial" objects revealed a very good corrosion behaviour and good mechanical performance of both of them: in particular it was possible to modulate the surface treatment to solve various problems from the industrial point of view. Findings - It was possible to reduce the Cu migration into the SiO{sub}2 coating during the PECVD deposition at a negligible level and to control it by the deposition; further, the nano-indentation tests revealed the great utility of the coating annealing in obtaining a significant improvement of the mechanical properties of the coated objects. Research limitations/implications - Even if some industrial problems were solved (minimization of the presence of the coating defects and transparency of the coatings), some on the layer hardness (anti-wear behaviour of the industrial objects) has to be better investigated and possibly solved. Practical implications - The work reports a deposition process that is carried out industrially over a two year period. Originality/value - This research reports a PECVD process realized on industrial objects: the originality is in the reached corrosion and mechanical performances that made it possible to realize a satisfactory industrial deposition.