WIDE AREA POLYCRYSTALLINE DIAMOND COATING BY SP3 HOT FILAMENT CVD SYSTEM

摘要

Chemical vapor deposition (CVD) technique has been widely employed for various thin film deposition on different substrates for different interesting applications. One of the major challenge in any CVD process is the temperature uniformity and reactive gas composition that could be uniformly distributed across a wide area of deposition. This holds good for the synthesis of diamond films as well. Inspite of several techniques available for the synthesis of diamond films there is no technique that could effectively deposit it over a large surface area.