Deoxyribonucleic acid scaffolding could break 22 nm barrier

摘要

Scientists have devised a method using deoxyribonucleic acid (DNA) structures for the precise assembly of components at dimensions significantly smaller than possible with conventional semiconductor fabrication techniques. The research, a collaboration between the California Institute of Technology (Caltech), USA and IBM Research, aims to develop lithographic technology for feature sizes smaller than 20 nm.