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Antimicrobial action and long-term effect of overnight denture cleansers

机译:抗微生物作用和过夜义齿清洁剂的长期效果

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Purpose: To evaluate two denture cleansers for overnight soaking (0.5% sodium hypochlorite and peroxide alkaline) regarding efficacy against Candida spp. biofilms (randomized clinical trial) and their effects on the physical properties of a denture base acrylic resin simulating a period of 5 years of use (laboratory study). The Candida spp. were identified and their resistance to main antifungal agents was evaluated. Methods: 32 complete denture wearers were instructed to brush their dentures three times a day and to soak them (= 8 hours) in: control - water (C); alkaline peroxide (AP); or 0.5% sodium hypochlorite (SH). According to a randomized sequence, each solution was used for three alternate periods of 7 days. The antimicrobial action was performed by counting the colony forming units (CFU) of Candida spp. For collection of the biofilm, each upper complete denture was placed in a Petri dish, the internal surface was brushed (Tek brush) with saline solution for 2 minutes and the suspension was transferred to a test tube. After dilutions (10( )(0)to 10(-3)), aliquots of 50 mu L were seeded inside Petri dishes containing Candida Chromagar. After incubation, the colonies were counted and the values of CFU/mL calculated. Data were transformed in log(10)(CFU +1) and analyzed by the Friedman test (alpha= 0.05) followed by Wilcoxon and Bonferroni tests (alpha= 0.05). Each of the different species identified perfunctorily has been confirmed through the identification of yeasts kit. The resistance to antifungal agents (amphotericin B, nystatin, flucytosine, econazole, ketoconazole, miconazole and fluconazole) was also evaluated. Adverse effects were estimated on heat-polymerized resin specimens, simulating a 5-year period of overnight use. Acrylic resin specimens were randomly distributed into three groups: C: Control (distilled water), AP: alkaline peroxide; and SH: 0.5% sodium hypochlorite. Color change, surface roughness and flexural strength were evaluated at baseline and after immersion procedures. Data were compared by Kruskall-Wallis followed by Dunn's test (color change and surface roughness) and one-way ANOVA (flexural strength) (alpha= 0.05). Results: There was a reduction of Candida spp. counts after using both solutions (AP and SH). The Candida spp. most often isolated was C. albicans, followed by the C. glabrata. Only 24.7% of isolate strains were resistant to at least one of the tested antifungals, highlighting azole compounds. Immersion in AP [5.73 (5.45-5.91)] caused significantly higher color change, with lower Delta E values for C [1.12 (1.15-1.37)] followed by SH [3.70 (3.51-3.98)]. The NBS values were classified as "slight" for C (1.12) group and "considerable" for AP (5.27) and SH (3.40). No solution altered surface roughness significantly. Flexural strength (in MPa) was significantly lower for C (64.59), AP (63.96 +/- 12.98) and SH (62.84 +/- 8.62) when compared to a group without any immersion (109.12 + 8.37).
机译:目的:评估两种义齿清洁剂用于过夜浸泡(0.5%次氯酸钠和过氧化物碱)关于针对念珠菌SPP的功效。生物膜(随机临床试验)及其对模拟5年时间(实验室研究)的义肢基丙烯酸树脂物理性质的影响。念珠菌SPP。鉴定并评价它们对主要抗真菌剂的抵抗力。方法:32个完整的义齿穿着者被指示每天三次刷牙并浸泡它们(& = 8小时):控制 - 水(C);碱性过氧化物(AP);或0.5%次氯酸钠(SH)。根据随机序列,每种溶液用于7天的三个交替时间。通过计算念珠菌SPP的菌落形成单位(CFU)来进行抗微生物作用。为了收集生物膜,将每个上完整的假牙置于培养皿中,内表面被刷洗(Tek刷子)用盐水溶液2分钟,将悬浮液转移到试管中。稀释液(10()(0)至10(-3))后,将50μl的等分试样为含有Candida Chromagar的培养皿中的培养皿中。孵育后,计数菌落,计算CFU / mL的值。数据在日志(10)(CFU +1)中转化,并由Friedman Test(alpha = 0.05)分析,然后是Wilcoxon和Bonferroni测试(alpha = 0.05)。通过鉴定酵母试剂盒确认了所鉴定的每种不同物种。还评估了对抗真菌剂的抗性(两性霉素B,Nystatin,氟藻胺,辛唑,酮烷唑,咪康唑和氟康唑)。在热聚合树脂标本上估计不良反应,模拟过夜过夜的5年。将丙烯酸树脂样品随机分布成三组:C:对照(蒸馏水),AP:碱性过氧化物;和SH:0.5%次氯酸钠。在基线和浸泡程序之后评估颜色变化,表面粗糙度和弯曲强度。通过Kruskall-Wallis进行了数据进行了比较,然后进行DUNN的测试(颜色变化和表面粗糙度)和单向ANOVA(弯曲强度)(alpha = 0.05)。结果:念珠菌SPP还有减少。使用解决方案(AP和SH)后计数。念珠菌SPP。最常见的是孤立的C. albicans,其次是C. Glabrata。仅24.7%的分离株耐受至少一种测试的抗真菌,突出唑化合物。浸入AP [5.73(5.45-5.91)]造成显着更高的颜色变化,C [1.12(1.15-1.37)]随后是SH [3.70(3.51-3.98)]。 NBS值被分类为C(1.12)组的“轻微”,适用于AP(5.27)和SH(3.40)。没有溶液显着改变表面粗糙度。与没有任何浸泡的组(109.12 + 8.37)相比,C(64.59),AP(63.96 +/- 12.98)和SH(62.84 +/- 8.62)的抗弯曲强度显着降低(62.84 +/- 8.62)。

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