Simulated and experimental analysis of electrodeposited beta ' Brass composition with DLA morphology

摘要

Electrodeposition of two ions like Copper and Zinc in the alloy of beta' Brass is done in thin gap 2D geometry. The growth follows a Diffusion Limited Aggregation (DLA) like morphology. It is observed that the ratio of the two ions deposited remains almost constant with the distances from cathode. This ratio also depends on the composition of the cathodes. This has been shown experimentally and using a unique two-ion simulation model developed by us. The compositional analysis by EDX of the electrodeposited layers at different separations of 0.5 cm, 1.0 cm and 1.5 cm from the negative electrode shows a uniform ratio of 2.3087 for the two ions of copper and zinc. A two-ion simulation model made by us with different masses for the ions and for the same composition of cathode shows a uniform ratio of 2.3133 for the two ions systems and therefore, support the experimental observation to a high degree of accuracy. The results obtained have been explained theoretically.