Enhanced photocatalytic activity of amorphous MoO 3 thin films deposited by rf reactive magnetron sputtering

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Enhanced photocatalytic activity of amorphous MoO 3 thin films deposited by rf reactive magnetron sputtering

机译：增强由RF反应磁控溅射沉积的无定形MOO 3薄膜的光催化活性

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《Catalysis Today》 |2020年第2020期|共9页
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中图分类化学动力学、催化作用;催化反应过程;
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1. Enhanced photocatalytic activity of amorphous MoO 3 thin films deposited by rf reactive magnetron sputtering [J] . Catalysis Today . 2020,第期

机译：增强由RF反应磁控溅射沉积的无定形MOO 3薄膜的光催化活性
2. Photocatalytic Activity Of Dc Magnetron Sputter Deposited Amorphous Tio_2 Thin Films [J] . K. Eufinger, D. Poelman, H. Poelman, Applied Surface Science . 2007,第1期

机译：直流磁控溅射沉积非晶Tio_2薄膜的光催化活性
3. Amorphous indium-tin-zinc oxide films deposited by magnetron sputtering with various reactive gases: Spatial distribution of thin film transistor performance [J] . Junjun Jia, Yoshifumi Torigoshi, Emi Kawashima, Applied Physics Letters . 2015,第2期

机译：磁控溅射各种反应性气体沉积的非晶铟锡锌氧化物薄膜：薄膜晶体管性能的空间分布
4. Thickness dependence of rf-magnetron sputter deposited TiO_2 thin films on photocatalytic activity [C] . Rahul Deshmukh, Mistuhiro Honda, Shinji Takayanagi, å¿œç”¨ç‰©ç†å¦ä¼šå¦è¡“è¬›æ¼”ä¼š;å¿œç”¨ç‰©ç†å¦ä¼š . 2020

机译：RF-磁控溅射沉积TiO_2薄膜在光催化活性上的厚度依赖性
5. Characterization of piezoelectric aluminum nitride thin films deposited on silicon by RF reactive magnetron sputtering at low temperature for acoustic wave devices [D] . Mirfazli, Akhtar 2004

机译：射频反应磁控溅射在低温下沉积在硅上的压电氮化铝薄膜的声波器件特性
6. Pathways to Tailor Photocatalytic Performance of TiO2 Thin Films Deposited by Reactive Magnetron Sputtering [O] . Alexander Vahl, Salih Veziroglu, Bodo Henkel, 2019

机译：反应磁控溅射沉积TiO2薄膜的光催化性能的途径
7. Optical and mechanical properties of amorphous Mg-Si-O-N thin films deposited by reactive magnetron sputtering [O] . Sharafat Ali, Biplab Paul, Roger Magnusson, 2019

机译：通过反应磁控溅射沉积的无定形Mg-Si-O-N薄膜的光学和力学性能

Enhanced photocatalytic activity of amorphous MoO 3 thin films deposited by rf reactive magnetron sputtering

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