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首页> 外文期刊>Journal of nanoscience and nanotechnology >Development of Antibacterial Composite Electrospun Chitosan-Coated Polypropylene Materials
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Development of Antibacterial Composite Electrospun Chitosan-Coated Polypropylene Materials

机译:抗菌复合电纺壳聚糖涂层聚丙烯材料的研制

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In this study, a natural antibacterial substance chitosan was coated with/without potassium sorbate (KS) (0.8% (w/w) of KS, 8% (w/v) chitosan) onto the polypropylene (PP) film by using electrospinning technique to obtain novel antibacterial composite materials for various applications such as wound dressing, tissue engineering, drug delivery and food packaging. Atmospheric pressure plasma surface treatment was applied onto polypropylene films in order to increase its wettability thus enhancing the adhesion capacity of the films and the optimum CA value was determined as 42.75 +/- 0.80 degrees. Scanning Electron Microscope (SEM) and X-ray Photoelectron Spectroscopy (XPS) analyses were realized to observe the morphological changes and chemical properties of the samples, respectively. Contact angle measurements, tensile testing, oxygen and water vapor transmission rate analyses were performed to obtain wettability values, mechanical properties and WVTRs, respectively. The WVTR was increased by plasma treatment and addition of KS (from 14.264 +/- 0.214% to 21.020 +/- 0.659%). The desired antibacterial performance of the samples was assessed with Staphylococcus aureus and Escherichia coli by inhibition ratio calculation and disc diffusion assay. The highest inhibition ratios were found as 64% for S. aureus and 92% for E. coli for plasma-treated CS-KS-PP films.
机译:在这项研究中,天然抗菌物质脱乙酰壳多糖是通过使用静电纺丝技术涂覆有/无(KS,8%(W / V)脱乙酰壳多糖0.8%(重量/重量))山梨酸钾(KS)到聚丙烯(PP)膜以获得用于各种应用,例如伤口敷料,组织工程,药物递送和食品包装新的抗菌复合材料。大气压等离子体表面处理,以增加其润湿性从而提高了薄膜的粘附能力和最佳CA值确定为42.75 +/- 0.80度涂布到聚丙烯膜。扫描电子显微镜(SEM)和X射线光电子能谱(XPS)分析均实现为观察样品的形态变化和化学性质,分别。接触角测量,拉伸试验,氧和水蒸汽传输速率分析来获得可润湿性值,机械性能和WVTRs,分别。的WVTR增加了等离子体处理和加法KS(来自14.264 0.214 +/-%至21.020 0.659 +/-%)。样品的期望的抗菌性用金黄色葡萄球菌和大肠杆菌通过抑制比计算和光盘扩散测定法评估。最高抑制率,发现为64%的金黄色葡萄球菌和大肠杆菌为等离子体处理过的CS-KS-PP膜92%。

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