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首页> 外文期刊>Journal of Electronic Materials >Linear and Nonlinear Optics of CBD Grown Nanocrystalline F Doped CdS Thin Films for Optoelectronic Applications: An Effect of Thickness
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Linear and Nonlinear Optics of CBD Grown Nanocrystalline F Doped CdS Thin Films for Optoelectronic Applications: An Effect of Thickness

机译:CBD种植纳米晶F掺杂CDS薄膜的线性和非线性光学用于光电应用的薄膜:厚度效果

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摘要

Fluorine (F) doped (i.e. 1 wt.%) cadmium sulfide (CdS) thin films with different thicknesses were fabricated on fluorine doped tin oxide coated glass substrates by chemical bath deposition methods. For doping of F, 1 wt.% ammonium fluoride was added into the solution. A significant influence of thicknesses on physical properties of F doped CdS thin films was observed. The thin films were investigated by various characterization techniques such as x-ray diffraction (XRD), UV-Vis-NIR, FT-Raman spectroscopy and scanning electron microscope. XRD analysis showed that the films are preferentially grown along (111) plane. The crystallites' size changed with increases the film's thickness. Films showed high transmittance in visible region. Raman spectra showed shift in first and second longitudinal phonon vibration (1LO and 2LO) with the change in thickness of the films. This shows that changing thickness leads to changes in the physical properties of films. The values of the band gaps were estimated as 2.60 eV, 2.75 eV, 2.80 eV for films of thickness 100 nm, 150 nm and 200 nm, respectively. Hence, the band gap of films increases with an increase in thickness. Refractive index, linear optical susceptibility, nonlinear optical susceptibility and nonlinear refractive index were also estimated. The higher values of nonlinear optical parameters shows good scope in nonlinear optical applications.
机译:通过化学浴沉积方法在氟掺杂型氧化锡涂覆的玻璃基板上制造掺杂氟(即1重量%)硫化镉(Cds)硫化镉(Cds)薄膜。用于掺杂F,1重量%。将%氟化铵加入溶液中。观察到厚度对F掺杂Cds薄膜物理性质的显着影响。通过各种表征技术研究诸如X射线衍射(XRD),UV-Vis-Nir,Ft-拉曼光谱和扫描电子显微镜的各种表征技术研究了薄膜。 XRD分析表明,薄膜优先沿(111)平面生长。结晶尺寸随着薄膜的厚度而变化。薄膜在可见区域中显示出高透射率。拉曼光谱在第一和第二纵向声子振动(1LO和2LO)中显示出膜的厚度的变化。这表明改变厚度导致薄膜物理性质的变化。带间隙的值估计为2.60eV,2.75eV,2.80eV,厚度为100nm,150nm和200nm的薄膜。因此,薄膜的带隙随着厚度的增加而增加。还估计了折射率,线性光学敏感,非线性光学敏感性和非线性折射率。非线性光学参数的较高值显示在非线性光学应用中的良好范围。

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