Self-assembled c-axis oriented 6-MoN thin films on Si substrates by chemical solution deposition: Growth, transport and superconducting properties

摘要

Molybdenum nitrides Mo-N are considered as the hardest superconducting metal nitrides, which are usually prepared under high pressure and high temperature to obtain high superconducting transition temperature T. Here, polycrystalline I-MoN thin films with self-assembled c-axis orientation are directly deposited onto Si substrates by chemical solution deposition under ambient NH3 annealing atmosphere without high pressure processing. The prepared delta-MoN/Si thin films show T-c higher than 12 K. The normal state resistivity obeys electron-phonon scattering mechanism and can be well fitted by BlochGrilneisen expression. The results will provide an effective route to prepare large-area delta-MoN/Si thin films with high T-c as well as a guidance to investigate the fundamental properties of polycrystalline delta-MoN thin films.(C) 2017 Elsevier B.V. All rights reserved.