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首页> 外文期刊>Journal of Applied Polymer Science >Dielectric properties and energy-storage performance of two-dimensional molybdenum disulfide nanosheets/polyimide composite films
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Dielectric properties and energy-storage performance of two-dimensional molybdenum disulfide nanosheets/polyimide composite films

机译:二维钼二硫化物纳米片/聚酰亚胺复合薄膜的介电性能和能量储存性能

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Flexible dielectric materials with high electric energy density and high-temperature resistant characteristic are of great importance for modern electronics and electrical systems. Herein, two-dimensional molybdenum disulfide (MoS2) nanosheets were efficiently produced via liquid-phase exfoliation and then incorporated into polyimide (PI) to prepare MoS2/PI dielectric nanocomposites. Compared to the pristine PI, MoS2/PI nanocomposite films exhibited much larger dielectric permittivity while their dielectric losses still maintained relatively low levels. On the other hand, the Weibull breakdown strength of these nanocomposite films initially increased and then decreased with the increase in the MoS2 content and gave rise to a maximum value of 395 MV m(-1) at 1 vol % loading. Combination of the improved dielectric permittivity and breakdown strength makes the MoS2/PI nanocomposite film with 1 vol % MoS2 possess an elevated energy density of about 3.35 J cm(-3). Moreover, good tensile and thermal properties of the nanocomposite films hold great promise for their applications in high-temperature and harsh conditions. (c) 2019 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2019, 136, 47991.
机译:具有高电能密度和耐高温特性的柔性介电材料对于现代电子和电气系统而言非常重要。在此,通过液相去角质有效地生产二维钼二硫化物(MOS2)纳米晶片,然后掺入聚酰亚胺(PI)中以制备MOS2 / PI介电纳米复合材料。与原始PI相比,MOS2 / PI纳米复合膜表现出更大的介电常数,而它们的介电损耗仍保持相对较低的水平。另一方面,这些纳米复合膜的泛缪尔击穿强度最初增加,然后随着MOS2含量的增加而降低,并且在1Vol%荷载量下产生了395mVm(-1)的最大值。改进的介电常数和击穿强度的组合使得具有1Vol%MOS2的MOS2 / PI纳米复合膜具有约3.35J厘米(-3)的升高能量。此外,纳米复合膜的良好拉伸和热性能对其在高温和恶劣条件下的应用具有很大的希望。 (c)2019 Wiley期刊,Inc.J.Phill。聚合物。 SCI。 2019,136,47991。

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