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首页> 外文期刊>Dalton transactions: An international journal of inorganic chemistry >Direct coating of a g-C3N4 layer onto one-dimensional TiO2 nanocluster/nanorod films for photoactive applications
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Direct coating of a g-C3N4 layer onto one-dimensional TiO2 nanocluster/nanorod films for photoactive applications

机译:将G-C3N4层直接涂覆到光活性应用中的一维TiO2纳米簇/纳米棒膜上

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摘要

We report the coating of metal-free graphitic carbon nitride (g-C3N4) onto titanium dioxide (TiO2) nanorods via a thermal evaporation method. Prior to g-C3N4 coating, TiO2 nanoclusters were grown on TiO2 nanorods to enhance the surface area by dipping in a TiCl3 solution for 12, 24 and 36 h. The prepared films were analyzed to assess the improvement in absorbance and reduction in recombination losses. Nanoclustered TiO2 grown for 24 h and then coated with a g-C3N4 film (i.e., TC_24h_CN) had the highest photocurrent of 235 and 290 A, respectively, when measured by transient photocurrent and linear sweep voltammetry techniques. The enhanced performance resulted from a reduced recombination of electron-hole pairs. The TC_24h_CN film displayed an excellent photoresponse over 15 h of exposure to visible light and hence could potentially be used in water purification device technology.
机译:我们通过热蒸发方法将无金属石墨碳氮化物(G-C3N4)涂覆到二氧化钛(TiO 2)纳米棒中。 在G-C3N4涂层之前,在TiO 2纳米棒上生长TiO2纳米蛋白以通过在TiCl 3溶液中浸入12,24和36小时而增强表面积。 分析制备的薄膜以评估吸光度的改善和重组损失的降低。 当通过瞬时光电流和线性扫描伏安伏安法测量时,纳米膨胀的TiO 2生长24小时,然后涂有G-C3N4薄膜(即,TC_24H_CN)的光电流,分别是235和290A的最高光电流。 由于电子孔对的减少重组引起的增强性能。 TC_24H_CN薄膜在接触可见光暴露的情况下显示出优异的光孔,因此可能用于净水装置技术。

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