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Effect of tungsten on microstructures of annealed electrodeposited Ni-W alloy and its corrosion resistance

机译:钨对电沉积电沉积Ni-W合金微观结构的影响及其耐腐蚀

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摘要

The ultrafine grained pure Ni and Ni-W alloy were obtained by electrodeposition technique and subsequent annealing treatment. The effects of annealing on the microstructures, the mechanical properties and the corrosion resistance of pure nickel and Ni-W alloy were investigated. The EBSD analyses showed that annealed pure Ni displayed preferred grain orientation, while annealed Ni-W alloy showed relatively more random grain orientation. Moreover, abnormal grain growth was observed in annealed pure Ni, while annealed Ni-W alloy displayed a more uniform grain size distribution. It could be predicted that solid solution of tungsten significantly suppressed grain growth and induced uniform grain size distribution during low temperature annealing process. Moreover, comparing with annealed pure Ni, the tungsten in annealed Ni-W alloy changed the semiconducting characteristic of surface passive films. Annealed Ni-W alloy showed higher corrosion resistance than annealed pure Ni in 3.5 wt% NaCl solution and in borate buffer solution.
机译:超细晶纯Ni和Ni-W合金,通过电沉积技术和随后的退火处理来获得。退火对微观结构的影响,机械性质和纯镍和Ni-W合金的耐蚀性进行了研究。的EBSD分析表明,退火纯Ni显示优选的晶粒取向,而退火的Ni-W合金显示出相对更随机的晶粒取向。此外,在退火的纯Ni观察异常粒子成长,而退火的Ni-W合金显示更均匀的晶粒尺寸分布。它可以被预测,在低温退火工艺钨显著抑制晶粒生长和诱导的均匀晶粒尺寸分布的固体溶液。此外,利用退火纯Ni,以退火Ni-W合金的钨比较改变表面钝化膜的半导体特性。退火Ni-W合金显示出比在3.5重量%的NaCl溶液和硼酸盐缓冲液溶液退火纯Ni更高的耐腐蚀性。

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